An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing
Author: Charles M. Settens
Publisher:
Total Pages: 215
Release: 2015
Genre: Metal oxide semiconductor field-effect transistors
ISBN:
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An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing
Language: en
Pages: 215

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

Authors: Charles M. Settens
Categories: Metal oxide semiconductor field-effect transistors
Type: BOOK - Published: 2015 - Publisher:

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X-Ray Metrology in Semiconductor Manufacturing
Language: en
Pages: 296

X-Ray Metrology in Semiconductor Manufacturing

Authors: D. Keith Bowen
Categories: Technology & Engineering
Type: BOOK - Published: 2018-10-03 - Publisher: CRC Press

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The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials
An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing
Language: en
Pages: 239

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

Authors:
Categories:
Type: BOOK - Published: 2015 - Publisher:

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Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics
X-ray Scattering from Semiconductors
Language: en
Pages: 303

X-ray Scattering from Semiconductors

Authors: Paul F. Fewster
Categories: Science
Type: BOOK - Published: 2000 - Publisher: World Scientific

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X-ray scattering is used extensively to provide detailed structural information about materials. Semiconductors have benefited from X-ray scattering techniques
Handbook of Critical Dimension Metrology and Process Control
Language: en
Pages: 376

Handbook of Critical Dimension Metrology and Process Control

Authors: Kevin M. Monahan
Categories: Technology & Engineering
Type: BOOK - Published: 1994 - Publisher: SPIE-International Society for Optical Engineering

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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics