Gate Stack and Silicide Issues in Silicon Processing

Gate Stack and Silicide Issues in Silicon Processing
Author:
Publisher:
Total Pages: 296
Release: 2002
Genre: Electric leakage
ISBN:

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Gate Stack and Silicide Issues in Silicon Processing
Language: en
Pages: 296
Authors:
Categories: Electric leakage
Type: BOOK - Published: 2002 - Publisher:

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Gate Stack and Silicide Issues in Silicon Processing:
Language: en
Pages: 254
Authors: L. A. Clevenger
Categories: Technology & Engineering
Type: BOOK - Published: 2014-06-05 - Publisher: Cambridge University Press

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As the feature size of microelectronic devices approaches the deep submicron regime, the process development and integration issues related to gate stack and si
Gate Stack and Silicide Issues in Silicon Processing: Volume 611
Language: en
Pages: 0
Authors: L. A. Clevenger
Categories: Technology & Engineering
Type: BOOK - Published: 2001-03-16 - Publisher: Cambridge University Press

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As the feature size of microelectronic devices approaches the deep submicron regime, the process development and integration issues related to gate stack and si
Gate Stack and Silicide Issues in Silicon:
Language: en
Pages: 290
Authors: S. A. Campbell
Categories: Technology & Engineering
Type: BOOK - Published: 2014-06-05 - Publisher: Cambridge University Press

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As technologists consider scaling microelectronic devices below the 100nm node, it is clear that many new materials will be introduced into the fab line. Determ
Gate Stack and Silicide Issues in Silicon: Volume 670
Language: en
Pages: 296
Authors: S. A. Campbell
Categories: Technology & Engineering
Type: BOOK - Published: 2002-02-26 - Publisher:

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 20