Kinetics And Mechanism Of Dissolution And Gasification In High Temperature Gas Metal Systems Interaction Of Tantalum Niobium And Vanadium With Partially Dissociated Nitrogen And Or Oxygen
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Kinetics and Mechanism of Dissolution and Gasification in High Temperature Gas/metal Systems: Interaction of Tantalum, Niobium, and Vanadium with Partially Dissociated Nitrogen And/or Oxygen
| Author | : Heng H. Feng |
| Publisher | : |
| Total Pages | : |
| Release | : 1975 |
| Genre | : |
| ISBN | : |
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