Low Dielectric Constant Materials for IC Applications

Low Dielectric Constant Materials for IC Applications
Author: Paul S. Ho
Publisher: Springer Science & Business Media
Total Pages: 323
Release: 2012-12-06
Genre: Technology & Engineering
ISBN: 3642559085

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Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-k) materials technology, thin film materials characterization, integration and reliability for back-end interconnects and packaging applications in microelectronics. Highly informative contributions from leading academic and industrial laboratories provide comprehensive information about materials technologies for


Low Dielectric Constant Materials for IC Applications
Language: en
Pages: 323
Authors: Paul S. Ho
Categories: Technology & Engineering
Type: BOOK - Published: 2012-12-06 - Publisher: Springer Science & Business Media

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Low dielectric constant materials are an important component of microelectronic devices. This comprehensive book covers the latest low-dielectric-constant (low-
Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set
Language: en
Pages: 562
Authors: Hari Singh Nalwa
Categories: Science
Type: BOOK - Published: 1999-09-07 - Publisher: Elsevier

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Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They w
Low-dielectric Constant Materials-- Synthesis and Applications in Microelectronics
Language: en
Pages: 312
Authors: Toh-Ming Lu
Categories: Electric insulators and insulation
Type: BOOK - Published: 1995 - Publisher:

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Study and Characterization of Low Dielectric Constant Materials for Interlayer Dielectric Applications
Language: en
Pages: 69
Authors: Babu Narayanan
Categories:
Type: BOOK - Published: 2003 - Publisher:

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High Dielectric Constant Materials
Language: en
Pages: 740
Authors: Howard Huff
Categories: Science
Type: BOOK - Published: 2005 - Publisher: Springer Science & Business Media

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Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). Mor