Synopsis Of Chemical Perspectives Of Microelectronic Materials Fall Meeting Of The Materials Research Society Held At Boston Massachusetts On November 27 December 2 1994

Symposium E opened with presentations spanning a range of new directions in the Chemistry of Electronic Materials. Novel methods for patterning or deposition of materials and for IN SITU monitoring of materials processing were highlighted. Very fine dimensional control over growth using focussed laser beams, controlled use of surface chemistry, and photochemistry were all demonstrated. Several commercial applications of monolayer control of film growth and uniformity using atomic layer epitaxy were reported. IN SITU probing of surface species and topography during film growth using IR spectroscopy, and TEM and AFM microscopies revealed new details of growth mechanisms. Despite decades of work in Si chemistry, this area continues to thrive. jg p.1.