Temperature Measurement during Millisecond Annealing

Temperature Measurement during Millisecond Annealing
Author: Denise Reichel
Publisher: Springer
Total Pages: 128
Release: 2016-01-07
Genre: Science
ISBN: 365811388X

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Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method’s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures.


Temperature Measurement during Millisecond Annealing
Language: en
Pages: 128
Authors: Denise Reichel
Categories: Science
Type: BOOK - Published: 2016-01-07 - Publisher: Springer

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Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing.
Flash Lamp Annealing
Language: en
Pages: 288
Authors: Lars Rebohle
Categories: Technology & Engineering
Type: BOOK - Published: 2019-07-27 - Publisher: Springer

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This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduc
Subsecond Annealing of Advanced Materials
Language: en
Pages: 330
Authors: Wolfgang Skorupa
Categories: Technology & Engineering
Type: BOOK - Published: 2013-12-16 - Publisher: Springer Science & Business Media

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The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. T
Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment
Language: en
Pages: 488
Authors: P. J. Timans
Categories: Gate array circuits
Type: BOOK - Published: 2008-05 - Publisher: The Electrochemical Society

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This issue describes processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: stra
Radiometric Temperature Measurements
Language: en
Pages: 479
Authors:
Categories: Science
Type: BOOK - Published: 2009-11-18 - Publisher: Academic Press

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This book describes the practice of radiation thermometry, both at a primary level and for a variety of applications, such as in the materials processing indust