Ultra Clean Processing Of Silicon Surfaces V
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Ultra Clean Processing of Silicon Surfaces V
Author | : Marc Heyns |
Publisher | : Trans Tech Publications Ltd |
Total Pages | : 340 |
Release | : 2001-01-02 |
Genre | : Technology & Engineering |
ISBN | : 3035707006 |
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Volume is indexed by Thomson Reuters CPCI-S (WoS). The proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
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