Gate Stack and Silicide Issues in Silicon: Volume 670

Gate Stack and Silicide Issues in Silicon: Volume 670
Author: S. A. Campbell
Publisher:
Total Pages: 296
Release: 2002-02-26
Genre: Technology & Engineering
ISBN:

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2002.


Gate Stack and Silicide Issues in Silicon: Volume 670
Language: en
Pages: 296
Authors: S. A. Campbell
Categories: Technology & Engineering
Type: BOOK - Published: 2002-02-26 - Publisher:

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 20
Gate Stack and Silicide Issues in Silicon Processing
Language: en
Pages: 296
Authors:
Categories: Electric leakage
Type: BOOK - Published: 2002 - Publisher:

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Gate Stack and Silicide Issues in Silicon Processing:
Language: en
Pages: 254
Authors: L. A. Clevenger
Categories: Technology & Engineering
Type: BOOK - Published: 2014-06-05 - Publisher: Cambridge University Press

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As the feature size of microelectronic devices approaches the deep submicron regime, the process development and integration issues related to gate stack and si
Amorphous and Heterogeneous Silicon Thin Films
Language: en
Pages: 1026
Authors:
Categories: Amorphous semiconductors
Type: BOOK - Published: 2001 - Publisher:

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Materials Issues in Novel Si-Based Technology: Volume 686
Language: en
Pages: 304
Authors: William G. En
Categories: Science
Type: BOOK - Published: 2002-07-15 - Publisher:

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.